HOME > 論文 > 書誌詳細Impact of doping profile on electrical performance of boron-doped diamond metal–oxide–semiconductor field-effect transistorsJ. Liu, T. Teraji. Journal of Applied Physics 140 [2] 024504. 2026.https://doi.org/10.1063/5.0318837 Open Access AIP Publishing (Publisher) Materials Data Repository (MDR) NIMS著者劉 江偉寺地 徳之Materials Data Repository (MDR)上の本文・データセットMDRavailable Impact of doping profile on electrical performance of boron-doped diamond metal–oxide–semiconductor field-effect transistors 作成時刻: 2026-07-15 03:07:59 +0900 更新時刻: 2026-08-16 04:31:33 +0900
