HOME > 論文 > 書誌詳細Thermal stress induced dislocation distribution in directional solidification of Si for PV applicationKarolin Jiptner, Bing Gao, Hirofumi Harada, Yoshiji Miyamura, Masayuki Fukuzawa, Koichi Kakimoto, Takashi Sekiguchi. Journal of Crystal Growth 408 19-24. 2014.https://doi.org/10.1016/j.jcrysgro.2014.09.017 NIMS著者Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-05-24 17:35:09 +0900更新時刻: 2024-04-02 04:11:18 +0900
