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Thermal stress induced dislocation distribution in directional solidification of Si for PV application

Karolin Jiptner, Bing Gao, Hirofumi Harada, Yoshiji Miyamura, Masayuki Fukuzawa, Koichi Kakimoto, Takashi Sekiguchi.
Journal of Crystal Growth 408 19-24. 2014.
https://doi.org/10.1016/j.jcrysgro.2014.09.017

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      Created at: 2016-05-24 17:35:09 +0900Updated at: 2024-04-02 04:11:18 +0900

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