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Combination of high hoop stress tolerance and a small screening current-induced field for an advanced Bi-2223 conductor coil at 4.2 K in an external field
(4.2K外部磁場中での先進Bi2223コイルのフープ応力耐性と遮蔽電流)

Y Yanagisawa, Y Xu, S Iguchi, M Hamada, S Matsumoto, G Nishijima, H Nakagome, T Takao, H Suematsu, Y Oshima, X Jin, M Takahashi, H Maeda.

NIMS著者


Materials Data Repository (MDR)上の本文・データセット


    作成時刻: 2016-10-26 15:39:20 +0900更新時刻: 2024-04-01 20:55:39 +0900

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