Versatile Post-Doping toward Two-Dimensional Semiconductors

Yuya Murai; Shaochun Zhang; Takato Hotta; Zheng Liu; Takahiko Endo; Hiroshi Shimizu; Yasumitsu Miyata; Toshifumi Irisawa; Yanlin Gao; Mina Maruyama; Susumu Okada; Hiroyuki Mogi; Tomohiro Sato; Shoji Yoshida; Hidemi Shigekawa; Takashi Taniguchi; Kenji Watanabe; Ruben Canton-Vitoria; Ryo Kitaura; Yuya Murai; Shaochun Zhang; Takato Hotta; Zheng Liu; Takahiko Endo; Hiroshi Shimizu; Yasumitsu Miyata; Toshifumi Irisawa; Yanlin Gao; Mina Maruyama; Susumu Okada; Hiroyuki Mogi; Tomohiro Sato; Shoji Yoshida; Hidemi Shigekawa; Takashi Taniguchi; Kenji Watanabe; Ruben Canton-Vitoria; Ryo Kitaura

doi:10.1021/acsnano.1c04584

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Versatile Post-Doping toward Two-Dimensional Semiconductors

Yuya Murai, Shaochun Zhang, Takato Hotta, Zheng Liu, Takahiko Endo, Hiroshi Shimizu, Yasumitsu Miyata, Toshifumi Irisawa, Yanlin Gao, Mina Maruyama, Susumu Okada, Hiroyuki Mogi, Tomohiro Sato, Shoji Yoshida, Hidemi Shigekawa, Takashi Taniguchi, Kenji Watanabe, Ruben Canton-Vitoria, Ryo Kitaura.

ACS Nano 15 [12] 19225-19232. 2021.

https://doi.org/10.1021/acsnano.1c04584

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作成時刻: 2022-01-26 10:06:41 +0900 更新時刻: 2026-10-08 06:52:03 +0900