Fabrication of optically active Er3+doped Bi2O3-SiO2 glass thin films by pulsed laser deposition

Shusaku Akiba; Masahiro Takakura; Akifumi Matsuda; Wakana Hara; Takashi Okada; Takahiro Watanabe; Yuki Kondo; Setsuro Ito; Parhat Ahmet; Toyohiro Chikyo; Setsuhisa Tanabe; Teiichi Hanada; Mamoru Yoshimoto; Shusaku Akiba; Masahiro Takakura; Akifumi Matsuda; Wakana Hara; Takashi Okada; Takahiro Watanabe; Yuki Kondo; Setsuro Ito; Parhat Ahmet; Toyohiro Chikyo; Setsuhisa Tanabe; Teiichi Hanada; Mamoru Yoshimoto

doi:10.1143/jjap.45.5933

Fabrication of optically active Er3+doped Bi2O3-SiO2 glass thin films by pulsed laser deposition

Shusaku Akiba, Masahiro Takakura, Akifumi Matsuda, Wakana Hara, Takashi Okada, Takahiro Watanabe, Yuki Kondo, Setsuro Ito, Parhat Ahmet, Toyohiro Chikyo, Setsuhisa Tanabe, Teiichi Hanada, Mamoru Yoshimoto.

Japanese Journal of Applied Physics 45 [7] 5933-5935. 2006.

https://doi.org/10.1143/jjap.45.5933

NIMS author(s)

CHIKYO, Toyohiro

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2016-05-24 15:14:22 +0900Updated at: 2024-04-01 23:35:59 +0900