Growth of (111)-oriented epitaxial and textured ferroelectric Y-doped HfO2 films for downscaled devices

Kiliha Katayama; Takao Shimizu; Osami Sakata; Takahisa Shiraishi; Syogo Nakamura; Takanori Kiguchi; Akihiro Akama; Toyohiko J. Konno; Hiroshi Uchida; Hiroshi Funakubo; Kiliha Katayama; Takao Shimizu; Osami Sakata; Takahisa Shiraishi; Syogo Nakamura; Takanori Kiguchi; Akihiro Akama; Toyohiko J. Konno; Hiroshi Uchida; Hiroshi Funakubo

doi:10.1063/1.4962431

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Growth of (111)-oriented epitaxial and textured ferroelectric Y-doped HfO2 films for downscaled devices

Kiliha Katayama, Takao Shimizu, Osami Sakata, Takahisa Shiraishi, Syogo Nakamura, Takanori Kiguchi, Akihiro Akama, Toyohiko J. Konno, Hiroshi Uchida, Hiroshi Funakubo.

Applied Physics Letters 109 [11] 112901. 2016.

https://doi.org/10.1063/1.4962431

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作成時刻: 2017-02-19 23:16:37 +0900 更新時刻: 2026-11-04 05:35:51 +0900