HOME > 論文 > 書誌詳細Growth of (111)-oriented epitaxial and textured ferroelectric Y-doped HfO2 films for downscaled devicesKiliha Katayama, Takao Shimizu, Osami Sakata, Takahisa Shiraishi, Syogo Nakamura, Takanori Kiguchi, Akihiro Akama, Toyohiko J. Konno, Hiroshi Uchida, Hiroshi Funakubo. Applied Physics Letters 109 [11] 112901. 2016.https://doi.org/10.1063/1.4962431 NIMS著者Materials Data Repository (MDR)上の本文・データセット作成時刻: 2017-02-19 23:16:37 +0900更新時刻: 2024-04-01 23:04:25 +0900