Growth of (111)-oriented epitaxial and textured ferroelectric Y-doped HfO2 films for downscaled devices

Kiliha Katayama; Takao Shimizu; Osami Sakata; Takahisa Shiraishi; Syogo Nakamura; Takanori Kiguchi; Akihiro Akama; Toyohiko J. Konno; Hiroshi Uchida; Hiroshi Funakubo; Kiliha Katayama; Takao Shimizu; Osami Sakata; Takahisa Shiraishi; Syogo Nakamura; Takanori Kiguchi; Akihiro Akama; Toyohiko J. Konno; Hiroshi Uchida; Hiroshi Funakubo

doi:10.1063/1.4962431

Growth of (111)-oriented epitaxial and textured ferroelectric Y-doped HfO2 films for downscaled devices

Kiliha Katayama, Takao Shimizu, Osami Sakata, Takahisa Shiraishi, Syogo Nakamura, Takanori Kiguchi, Akihiro Akama, Toyohiko J. Konno, Hiroshi Uchida, Hiroshi Funakubo.

Applied Physics Letters 109 [11] 112901. 2016.

https://doi.org/10.1063/1.4962431

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Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2017-02-19 23:16:37 +0900 Updated at: 2026-11-04 05:35:51 +0900