Patterning metal contacts on monolayer MoS2 with vanishing Schottky barriers using thermal nanolithography

Xiaorui Zheng; Annalisa Calò; Edoardo Albisetti; Xiangyu Liu; Abdullah Sanad M. Alharbi; Ghidewon Arefe; Xiaochi Liu; Martin Spieser; Won Jong Yoo; Takashi Taniguchi; Kenji Watanabe; Carmela Aruta; Alberto Ciarrocchi; Andras Kis; Brian S. Lee; Michal Lipson; James Hone; Davood Shahrjerdi; Elisa Riedo; Xiaorui Zheng; Annalisa Calò; Edoardo Albisetti; Xiangyu Liu; Abdullah Sanad M. Alharbi; Ghidewon Arefe; Xiaochi Liu; Martin Spieser; Won Jong Yoo; Takashi Taniguchi; Kenji Watanabe; Carmela Aruta; Alberto Ciarrocchi; Andras Kis; Brian S. Lee; Michal Lipson; James Hone; Davood Shahrjerdi; Elisa Riedo

doi:10.1038/s41928-018-0191-0

Patterning metal contacts on monolayer MoS2 with vanishing Schottky barriers using thermal nanolithography

Xiaorui Zheng, Annalisa Calò, Edoardo Albisetti, Xiangyu Liu, Abdullah Sanad M. Alharbi, Ghidewon Arefe, Xiaochi Liu, Martin Spieser, Won Jong Yoo, Takashi Taniguchi, Kenji Watanabe, Carmela Aruta, Alberto Ciarrocchi, Andras Kis, Brian S. Lee, Michal Lipson, James Hone, Davood Shahrjerdi, Elisa Riedo.

Nature Electronics 2 [1] 17-25. 2019.

https://doi.org/10.1038/s41928-018-0191-0

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2019-03-01 11:45:07 +0900Updated at: 2024-03-31 01:23:26 +0900