HOME > Article > DetailNanoparticle Formation and Microstructural Changes in Silicon Thermal Oxide Induced by High-flux Negative Copper Implantation(大電流負Cuイオン注入によるシリコン熱酸化膜中のナノ粒子形成とミクロ構造変化)AMEKURA, Hiroshi, 梅田直樹, 大久保成彰, 李致圭, TAKEDA, Yoshihiko, KISHIMOTO, Naoki. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS 345-349. 2001.NIMS author(s)AMEKURA, HiroshiTAKEDA, YoshihikoFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2022-11-15 00:39:43 +0900 Updated at: 2022-11-15 00:39:43 +0900