HOME > 論文 > 書誌詳細Interface Chemistry and Dielectric Optimization of TMA-Passivated high-k/Ge Gate Stacks by ALD-Driven Laminated InterlayersDie Wang, Gang He, Lin Hao, Lesheng Qiao, Zebo Fang, Jiangwei Liu. ACS Applied Materials & Interfaces 12 [22] 25390-25399. 2020.https://doi.org/10.1021/acsami.0c02963 NIMS著者劉 江偉Materials Data Repository (MDR)上の本文・データセット作成時刻: 2020-11-20 03:00:13 +0900更新時刻: 2024-04-02 00:40:53 +0900
