Interface Chemistry and Dielectric Optimization of TMA-Passivated high-k/Ge Gate Stacks by ALD-Driven Laminated Interlayers | SAMURAI, NIMS Researchers Directory Service

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Interface Chemistry and Dielectric Optimization of TMA-Passivated high-k/Ge Gate Stacks by ALD-Driven Laminated Interlayers

Die Wang, Gang He, Lin Hao, Lesheng Qiao, Zebo Fang, Jiangwei Liu.

ACS Applied Materials & Interfaces 12 [22] 25390-25399. 2020.

https://doi.org/10.1021/acsami.0c02963

NIMS author(s)

LIU, Jiangwei

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2020-11-20 03:00:13 +0900 Updated at: 2026-10-04 04:22:09 +0900

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