Size and depth distributions of nickel nanoparticles in SiO2 fabricated by negative-ion implantation of 60 keV | SAMURAI, NIMS Researchers Directory Service

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Size and depth distributions of nickel nanoparticles in SiO2 fabricated by negative-ion implantation of 60 keV
(60 keV負イオン注入法でSiO2中に作製したNiナノ粒子のサイズおよび深さ分布)

AMEKURA, Hiroshi, UMEDA, Naoki, TAKEDA, Yoshihiko, KITAZAWA, Hideaki, KISHIMOTO, Naoki.

TRANSACTION OF THE MATERIALS RESEARCH SOCIETY OF JAPAN 28 [2] 465-468. 2003.

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2016-05-24 11:51:17 +0900 Updated at: 2018-12-15 00:48:07 +0900

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