Dual-Step Chemical Treatment of Wafer-Scale Metal–Organic Chemical Vapor Deposition Grown Monolayer Molybdenum Disulfides

Juhwan Lim; Anh Tuấn Hoàng; Zhaojun Li; Tran Thi Ngoc Van; Jung-In Lee; Kihyun Lee; Nicolas Gauriot; Kyle Frohna; Takashi Taniguchi; Kenji Watanabe; Bonggeun Shong; Kwanpyo Kim; Samuel D. Stranks; Jong-Hyun Ahn; Manish Chhowalla; Akshay Rao; Juhwan Lim; Anh Tuấn Hoàng; Zhaojun Li; Tran Thi Ngoc Van; Jung-In Lee; Kihyun Lee; Nicolas Gauriot; Kyle Frohna; Takashi Taniguchi; Kenji Watanabe; Bonggeun Shong; Kwanpyo Kim; Samuel D. Stranks; Jong-Hyun Ahn; Manish Chhowalla; Akshay Rao

doi:10.1021/acsnano.5c08927

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Dual-Step Chemical Treatment of Wafer-Scale Metal–Organic Chemical Vapor Deposition Grown Monolayer Molybdenum Disulfides

Juhwan Lim, Anh Tuấn Hoàng, Zhaojun Li, Tran Thi Ngoc Van, Jung-In Lee, Kihyun Lee, Nicolas Gauriot, Kyle Frohna, Takashi Taniguchi, Kenji Watanabe, Bonggeun Shong, Kwanpyo Kim, Samuel D. Stranks, Jong-Hyun Ahn, Manish Chhowalla, Akshay Rao.

ACS Nano 19 [39] 34698-34707. 2025.

https://doi.org/10.1021/acsnano.5c08927

Open Access American Chemical Society (ACS) (Publisher) Materials Data Repository (MDR)

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MDRavailable Dual-Step Chemical Treatment of Wafer-Scale Metal–Organic Chemical Vapor Deposition Grown Monolayer Molybdenum Disulfides

作成時刻: 2025-10-15 03:09:28 +0900 更新時刻: 2026-09-26 04:35:25 +0900