Fabrication of β-Ga <sub>2</sub> O <sub>3</sub> /air-gap structures on (001) β-Ga <sub>2</sub> O <sub>3</sub> using HCl gas etching | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

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Fabrication of β-Ga ₂ O ₃ /air-gap structures on (001) β-Ga ₂ O ₃ using HCl gas etching

Takayoshi Oshima, Yuichi Oshima.

Science and Technology of Advanced Materials: Methods 5 [1] 2554046. 2025.

https://doi.org/10.1080/27660400.2025.2554046

Open Access Informa UK Limited (Publisher) Materials Data Repository (MDR)

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Materials Data Repository (MDR)上の本文・データセット

MDRavailable Fabrication of β-Ga <sub>2</sub> O <sub>3</sub> /air-gap structures on (001) β-Ga <sub>2</sub> O <sub>3</sub> using HCl gas etching

作成時刻: 2025-09-05 03:12:07 +0900 更新時刻: 2026-10-18 04:30:31 +0900

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