Preserving Twist-Angle in Marginally Twisted Double-Bilayer Graphene Devices during Fabrication: Implications for Highly Uniform Superlattice Device Applications | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

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Preserving Twist-Angle in Marginally Twisted Double-Bilayer Graphene Devices during Fabrication: Implications for Highly Uniform Superlattice Device Applications

Hyeon-Woo Jeong, Jiho Kim, Boknam Chae, Kenji Watanabe, Takashi Taniguchi, Gil-Ho Lee.

ACS Applied Nano Materials 8 [22] 11240-11245. 2025.

https://doi.org/10.1021/acsanm.5c00459

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作成時刻: 2025-06-17 03:07:23 +0900 更新時刻: 2026-10-01 06:25:37 +0900

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