Negative Copper Ion Implantation into Silica Glasses at High Dose Rates and the Optical Measurements | SAMURAI, NIMS Researchers Directory Service

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Negative Copper Ion Implantation into Silica Glasses at High Dose Rates and the Optical Measurements
(高線量率における石英ガラスへの負Cuイオン注入及びその光学的測定)

KISHIMOTO, Naoki, V.T.Gritsyna, KONO, Kenichiro, AMEKURA, Hiroshi, 斎藤鉄哉.

Nuclear Instruments and Methods in Physical Research Section B 579-582. 1997.

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Created at: 2022-11-15 00:39:09 +0900Updated at: 2022-11-15 00:39:09 +0900

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