HOME > 論文 > 書誌詳細The Reststrahlen Effect in the Optically Thin Limit: A Framework for Resonant Response in Thin MediaEric Y. Ma, Jenny Hu, Lutz Waldecker, Kenji Watanabe, Takashi Taniguchi, Fang Liu, Tony F. Heinz. Nano Letters 22 [20] 8389-8393. 2022.https://doi.org/10.1021/acs.nanolett.2c02819 NIMS著者渡邊 賢司谷口 尚Materials Data Repository (MDR)上の本文・データセット作成時刻: 2022-11-01 03:24:41 +0900更新時刻: 2024-04-02 05:26:45 +0900
