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Structures and Properties of an Ultra-Low-k Material:Classical Molecular Dynamics and First-Principles Calculations
(超低誘電率材料の構造と物性:古典的分子動力学計算と第一原理計算)

USHIO, Jiro, HAMADA, Tomoyuki, OHNO, Takahisa, NAKAO Shin-Ichi, YONEDA Katsumi, KATO Manabu, KOBAYASHI Nobuyoshi.
MRS Symposium Proceedings: Materials, Technology and Reliability of Low-K Dielectrics and Copper Interconnects 21-26. 2006.

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