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A novel fabrication technique for three-dimensional semiconductor photonic crystals
(3次元半導体フォトニック結晶の新しい作製方法)

K. Aoki, MIYAZAKI, Hideki, H. Hirayama, K. Inoshita, T. Baba, 新谷紀雄, Y. Aoyagi, K. Aoki, H. Hirayama, K. Inoshita, T. Baba, 新谷紀雄, Y. Aoyagi.

NIMS author(s)


Fulltext and dataset(s) on Materials Data Repository (MDR)


    Created at: 2017-02-26 23:59:41 +0900 Updated at: 2017-03-17 02:04:49 +0900

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