HOME > Proceedings > DetailPlasma-surface chemistry in Si/Cl systems(ハロゲンプラズマ+シリコン表面系の化学)KOMATSU, Shojiro, 寒川誠二, OKADA, Katsuyuki, 守吉佑介, 三友護. ISAM2002 proceedings 121-122. 2002.NIMS author(s)OKADA, KatsuyukiFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-02-27 00:03:50 +0900 Updated at: 2017-03-17 02:08:35 +0900