HOME > 会議録 > 書誌詳細CMOS patterning over high-aspect ratio topographies for N10/N7 using spin-on carbon hardmasksToby Hopf, Monique Ercken, Geert Mannaert, Eddy Kunnen, Tao Zheng, Nadia Vandenbroeck, Farid Sebaai, Yoshiaki Kikuchi, Hans Mertens, Stefan Kubicek, Steven Demuynck, Naoto Horiguchi. SPIE Proceedings 1014618. 2017.https://doi.org/10.1117/12.2257668 NIMS著者Materials Data Repository (MDR)上の本文・データセット作成時刻: 2026-09-01 18:18:43 +0900 更新時刻: 2026-10-03 07:10:09 +0900
