CMOS patterning over high-aspect ratio topographies for N10/N7 using spin-on carbon hardmasks | SAMURAI, NIMS Researchers Directory Service

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CMOS patterning over high-aspect ratio topographies for N10/N7 using spin-on carbon hardmasks

Toby Hopf, Monique Ercken, Geert Mannaert, Eddy Kunnen, Tao Zheng, Nadia Vandenbroeck, Farid Sebaai, Yoshiaki Kikuchi, Hans Mertens, Stefan Kubicek, Steven Demuynck, Naoto Horiguchi.

SPIE Proceedings 1014618. 2017.

https://doi.org/10.1117/12.2257668

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2026-09-01 18:18:43 +0900 Updated at: 2026-11-04 07:11:33 +0900

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