HOME > Presentation > Detail(Characteristics of Higher-k films fabricated by ALD and low annealing temperature process)生田目 俊秀. The AVS Topical Conference on Atomic Layer Deposition 2014 . June 15, 2014-June 18, 2014. InvitedNIMS author(s)NABATAME, ToshihideFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-02-14 11:42:29 +0900Updated at: 2024-03-05 11:45:07 +0900