HOME > Presentation > Detail摩擦力顕微鏡原子分解能観察による MOCVD-MoS2成膜過程の S 欠陥定量評価(Atomic-scale quantitative evaluation of S defects during MOCVD-MoS2 film formation by friction force microscopy)松本 昂征, 西村 知紀, 金橋 魁利, 佐久間 芳樹, 長汐 晃輔. 第73回応用物理学春季学術講演会. March 15, 2026-March 18, 2026.NIMS author(s)SAKUMA, YoshikiFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2026-06-19 03:06:51 +0900 Updated at: 2026-06-19 03:06:51 +0900