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シリコン表面酸化中の表面応力変動におよぼす表面不均一性の効果
(Effect of Surface Disorder on the Surface Stress of Si(100)during Oxidation)
Third International Symposium on Control of Semiconductor Interf. October 25, 1999-October 29, 1999.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-02-14 11:36:32 +0900 Updated at: 2017-07-10 17:56:41 +0900