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Characteristics of Low Pressure Inductively Coupled CH4/CO/H2 Plasma Used for Nanostructured Carbon Deposition
(ナノ構造カーボン合成用低圧誘導結合CH4/CO/H2プラズマの特性)
第21回プラズマプロセシング研究会. January 28, 2004-January 30, 2004.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2022-09-05 11:26:21 +0900 Updated at: 2022-09-05 11:26:21 +0900