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ＭＯＳ構造のバイアス印加下ＸＰＳ測定
(XPS analysis of MOS structure under bias voltage applied between gate and silicon)
第55回応用物理学関係連合講演会. March 27, 2008-March 30, 2008.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-02-14 11:09:47 +0900 Updated at: 2017-07-10 20:09:24 +0900