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原子レベルで精密制御された人工原子としての原子層堆積酸化物で途切れなく埋め込まれた分子性酸化物
(Molecular Oxide Embedded in Atomic Layer Deposition Oxide as Atomic-Level Precise Artificial Atom)
The AVS Topical Conference on Atomic Layer Deposition (ALD 2013). July 28, 2013-July 31, 2013.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-02-14 11:19:15 +0900 Updated at: 2017-07-10 21:40:16 +0900