HOME > Presentation > Detail
Atomic Layer Deposition of SnO Film Using Liquid Sn(EtCp)2 Precursor and Combinations of H2O and H2 Plasma
The AVS 24th International Conference on Atomic Layer Deposition (ALD 2024). August 04, 2024-August 07, 2024.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2024-11-13 03:15:59 +0900 Updated at: 2024-11-13 03:15:59 +0900