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アルミ陽極酸化膜を用いた次世代不揮発性メモリの開発
(Development of a next-generation-nonvolatile-memory using aluminum anodic oxide film )
第45回茅コンファレンス. August 19, 2007-August 22, 2007.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-02-14 11:17:16 +0900 Updated at: 2017-07-10 19:59:34 +0900