HOME > Presentation > DetailPドープSiナノ細線中の欠陥の水素・酸素による不活性化とドナー濃度制御(Passivation of defects and doping control in silicon nanowires by hydrogen and oxygen treatments)松下聡, 深田 直樹, 鶴井隆雄, 内田紀行, 村上浩一. 2006年秋季第67回応用物理学会学術講演会. August 29, 2006-September 01, 2006.NIMS author(s)FUKATA, NaokiFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-02-14 11:45:51 +0900Updated at: 2017-07-10 19:39:24 +0900