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大電流Cuイオン注入した絶縁体の光化学特性
(Ophcal Properties of High-Current Cu-ion-implanted Isolators)
第59回応用物理学会学術講演会. September 15, 1998-September 18, 1998.
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Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-02-14 11:25:14 +0900 Updated at: 2017-07-10 17:50:18 +0900