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TiとNi原子のH線端化Si(001)(2×1)表面における初期過程第一原理内研究
(A first-priaciplas study on initial processos of Tiand Ni atomns on the H-termiaeted Si(001)(2×1) surface)
3rd Inter Symp on Surf Sci for Micro-and Nano-Device Fabrieation. November 29, 1999-December 01, 1999.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-02-18 01:42:54 +0900 Updated at: 2017-07-10 17:56:25 +0900