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極薄熱酸化膜上に形成したHfO2-Al2O3縦方向組成傾斜膜の構造観察と電気的特性評価
(Structure and electrical characterization for vertical composition spread HfO2-Al2O3 on thermally grown SiO2 on Si(100))
第64回応用物理学会学術講演会. August 30, 2003-September 02, 2003.
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Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-01-08 03:57:22 +0900 Updated at: 2018-05-30 19:14:04 +0900