HOME > Presentation > Detail
A novel fabrication technique for three-dimensional semiconductor photonic crystals
(3次元半導体フォトニック結晶の新しい作製方法)
20th Electronic Materials Symposium. June 20, 2001-June 22, 2001.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2022-09-05 11:08:50 +0900 Updated at: 2022-09-05 11:08:50 +0900