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ALD法によるHigher-k絶縁膜の低温作製とCMOSへの展開
(Low temperature growth of Higher-k insulator by ALD process and its application for CMOS)
第21回シンポジウム「ALDプロセスの基礎と応用」. 2013. Invited
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-02-14 11:10:40 +0900Updated at: 2024-03-05 11:44:47 +0900