HOME > Presentation > DetailImproved transport properties of microcrystalline silicon films grown by HWCVD with a variable hydrogen dilution process(HWCVD法によりシランの水素希釈率を変化させて作製した微結晶シリコン膜におけるキャリア輸送特性の向上)NIIKURA, Chisato. 4th International Conference on Hot-Wire CVD(Cat-CVD) Process. October 04, 2006-October 08, 2006.NIMS author(s)NIIKURA, ChisatoFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2022-09-05 11:54:05 +0900Updated at: 2022-09-05 11:54:05 +0900