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プラズマ酸化によるシリコン表面酸化層の微小応力の研究
(Silicon Surface Stress during a Plasma Oxidation with Applying Souwple Bias )
第４回薄膜表面物理研究会. January 22, 1999-January 23, 1999.
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Created at: 2017-02-18 01:37:16 +0900 Updated at: 2017-07-10 17:53:16 +0900