HOME > Presentation > Detail助剤量の異なる窒化ケイ素セラミックスの1350℃における引張クリープと酸化特性(Tensile Creep and Oxidation Behaviour of silicon Nitride with different Additive Contents at 1300C)J.W. Cao, 岡田明, 廣崎 尚登, J.W. Cao, 岡田明. High Temperature Materials 2001. May 31, 2001-June 01, 2001.NIMS author(s)HIROSAKI, NaotoFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-02-14 11:35:36 +0900 Updated at: 2017-07-10 18:14:49 +0900