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アトムプローブ法によるGe/Siコアシェルナノワイヤ中の不純物分布
(Characterization of dopant in Individual Si / Ge Core-Shell Nanowires Investigated by Atom Probe Tomography)
春季第63回応用物理学関係連合講演会. March 19, 2016-March 22, 2016.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-01-08 04:30:47 +0900 Updated at: 2017-07-10 22:22:57 +0900