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Si熱酸化膜中及びSiO2/Si界面での重水素挙動
(Behavior of deuterium atoms in thermally oxidized SiO2 layer and at Si/ SiO2 interface)

辻村理俊, 白川亮太, 内田紀行, 深田 直樹, 比田剣之輔, 小島健太郎, 村上浩一.
春季第55回応用物理学会学術講演会. March 27, 2008-March 30, 2008.

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    Created at: 2017-01-08 04:56:53 +0900 Updated at: 2017-07-10 20:09:03 +0900

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