HOME > Presentation > DetailMaterial Selection for the Metal Gate/High-k TransistorsY.Akasaka, K.Miyagawa, A.Kariya, H.Shoji, T.Aoyama, S.Kume, O.Ogawa, 白石賢二, 上殿明良, 山部紀久夫, 知京 豊裕, 中島 清美, M.Yasuhara, K.Yamada, T.Arikago. solid State Device and Materials 2004. September 15, 2004-September 17, 2004.NIMS author(s)CHIKYO, ToyohiroFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-02-14 11:39:44 +0900 Updated at: 2017-07-10 19:07:42 +0900