HOME > Presentation > DetailEvaluation of the Ti diffusion process during the fabrication of Ti doped neat stoichiometric lithium niobate waveguides(定比二オブ酸リチウム導波路形成におけるTi拡散プロセス評価)Rangasamy Mohan KUMAR, RAVI, GANESAN, NAKAMURA, Masaru, TAKEKAWA, Shunji, KITAMURA, Kenji. 第49回人工結晶討論会. November 09, 2004-November 10, 2004.NIMS author(s)NAKAMURA, MasaruFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-01-08 04:17:39 +0900Updated at: 2017-07-10 19:10:23 +0900