Impact of Additional Factor in Threshold Voltage Variability of Metal/High-k Gate Stacks and Its Reduction by Controlling Crystalline Structure and Grain Size in the Metal Gates
2008 IEEE International Electron Devices Meeting. 2008.
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Materials Data Repository (MDR)上の本文・データセット
作成時刻: 2017-02-14 10:55:49 +0900更新時刻: 2017-07-10 20:23:41 +0900