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Impact of Additional Factor in Threshold Voltage Variability of Metal/High-k Gate Stacks and Its Reduction by Controlling Crystalline Structure and Grain Size in the Metal Gates
2008 IEEE International Electron Devices Meeting. December 15, 2008-December 17, 2008.
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Created at: 2017-02-14 10:55:49 +0900 Updated at: 2017-07-10 20:23:41 +0900