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シリコン表面応力の研究：結晶乱れによる応力の電子線照射による緩和
(Surface Stress Study on Silicon; Relaxation of Disorder-induced Stress by Election Irradiation )
第６１回応用物理学会学術講演会. September 03, 2000-September 07, 2000.
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Created at: 2017-02-14 11:34:42 +0900 Updated at: 2017-07-10 18:05:36 +0900