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ドライエッチング加工による接着リッジ導波路型擬似位相整合タイプⅡ相関光子対発生デバイス
(Quasi-phase matched TypeⅡtwin photon generator with adhered ridge waveguide fabricated by dry etching method)
第53回応用物理学関係連合講演会. March 22, 2006-March 26, 2006.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-02-14 11:32:31 +0900Updated at: 2018-05-21 20:01:05 +0900