HOME > Presentation > Detail反応性RFスパッタリングによる窒素ドープSiナノ結晶の作製(Fabrication of nitrogen-doped silicon nanoparticles by reactive RF sputtering)Shun Ito, Kenji Hirakuri, 佐藤 慶介, 深田 直樹. E-MRS 2012 FALL MEETING. September 17, 2012-September 21, 2012.NIMS author(s)FUKATA, NaokiFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-01-08 04:06:17 +0900Updated at: 2017-07-10 21:28:34 +0900