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シリコンの極薄酸化膜の低温成長と特性
(Low temperature ultra thin exide growth and its film properties)
表面反応シンポジウム. November 20, 1997-November 21, 1997.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-01-08 03:41:33 +0900 Updated at: 2017-07-10 17:45:43 +0900