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高速偏光解析によるSi表面酸化超薄膜成長速度の基板結晶方向依存.
(Crystal Orientation Dependence of Ultra Thin Oxie Film Growth on Si-Surface by a Rapid Ellipsometry.)

黒木, 北島 正弘, 中村一隆, 河辺隆也, 黒木, 中村一隆, 河辺隆也.
日本物理学会. October 12, 1993-October 15, 1993.

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